Formation of Deep Sub-Micrometer Cobalt Silicided Poly Gate Using Bilayer Processes

Formation of Deep Sub-Micrometer Cobalt Silicided Poly Gate Using Bilayer Processes

Author(s):

Publication title:

ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

95-5

Pub. Year:

1995

Page(from):

519

Page(to):

524

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770996 [1566770998]

Language:

English

Call no.:

E23400/952065

Type:

Conference Proceedings

Details

TDL ID:	ZA00013811
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Ultra Large Scale Integration Science and Technology
Conf. info. (Number):	8th
Conf. info. (Venue):	Reno, NV, USA
Conf. info. (Date):	1995.05.22-1995.05.26

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