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Selective Remote Plasma Etching of Si3N4 Over SIO2 at Elevated Temperature

Author(s):
Staffa, J.
Luther, B.
Hwang, D.
Ruzyllo, J.
Grant, R.
March, D.
1 more
Publication title:
ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
95-5
Pub. Year:
1995
Page(from):
283
Page(to):
289
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770996 [1566770998]
Language:
English
Call no.:
E23400/952065
Type:
Conference Proceedings

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