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Influence of Flouring and BF2 Implants on the Transient Enhanced Diffusion of Boron

Author(s):
Vuong, H-H.
Gossmann, H.-J.
Rafferty, C.S.
Luftman, H.S.
Unterwald, F.C.
Jacobson, D.C.
Ahrens, R.E
Boone, T.
Zeitzoff, P.M.
4 more
Publication title:
ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
95-5
Pub. date:
1995
Page(from):
6
Page(to):
12
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770996 [1566770998]
Language:
English
Call no.:
E23400/952065
Type:
Conference Proceedings

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