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Chemistry Modeling in Downstream Etch Systems from the Plasma Source to the Etch Chamber

Author(s):
Publication title:
Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
95-2
Pub. Year:
1995
Page(from):
608
Page(to):
630
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770965 [1566770963]
Language:
English
Call no.:
E23400/952062
Type:
Conference Proceedings

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