The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography
- Author(s):
Liang, J. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) Le, Z. ( Zhejiang Univ. of Technology (China) ) Wang, W. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) Peng, L. ( BEPC National Lab. (China) ) Lan, W. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) Ming, A. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) Ye, J. ( Zhejiang Univ. of Technology (China) ) Quan, B. ( Zhejiang Univ. of Technology (China) ) Yao, J. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) Xuan, M. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) Wang, L. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 975
- Page(to):
- 984
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |