Blank Cover Image

Evaluation of image placement of EPL stencil masks

Author(s):
Yusa, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Ishikawa, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kinase, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Takikawa, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Fujita, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sano, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Houga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
923
Page(to):
931
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Takikawa, T., Ishikawa, M., Yusa, S., Kinase, Y., Fujita, H., Hoga, M., Hayashi, N., Sano, H.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Development of a LEEPL mask: flatness and IP measurements

Aritsuka, Y., Kitada, M., Kurosawa, M., Takikawa, T., Fujita, H., Sano, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings CD-measurement technique for hole patterns on stencil mask

Ishikawa, M., Yusa, S., Takikawa, T., Fujita, H., Sano, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication

M. Ishikawa, M. Sakaki, N. Kuwahara, H. Fujita, T. Takikawa, H. Sano, M. Hoga, N. Hayashi

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]

Kitada, M., Yusa, S., Kuwahara, N., Fujita, H., Takikawa, T., Sano, H., Hoga, M.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Primary evaluation of proximity and resist heating effects observed in high-acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication

Kuwahara, N., Nakagawa, H., Kurihara, M., Hayashi, N., Sano, H., Maruta, E., Takikawa, T., Noguchi, S.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings 200-mm EPL stencil mask fabrication and metrology

Fujita, H., Takigawa, T., Ishikawa, M., Aritsuka, Y., Yusa, S., Hoga, M., Sano, H.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Dynamic image placement accuracy of a stencil mask

Takenaka, H., Yamashita, H., Takahashi, K., Tomo, Y., Watanabe, M., Iwasaki, T., Yamamoto, J., Yamabe, M.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Experimental analysis of image placement accuracy of single-membrane masks for LEEPL [5853-81]

Kitada, M., Aritsuka, Y., Yusa, S., Kuwahara, N., Fujita, H., Takikawa,T., Sano, H., Hoga, M.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings EPL stencil mask defect inspection system using transmission electron beam

Yamamoto, J., Iwasaki, T., Yamabe, M., Anazawa, N., Maruyama, S., Tsuta, K.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Evaluation of a transmission CD-SEM for EB stencil masks

Ishikawa, M., Fujita, H., Hoga, M., Sano, H.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Quality assurance of embedded attenuated phase-shift masks

Miyashita,H., Fujita,H., Yokoyama,T., Hayashi,N., Sano,H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12