Evaluation of image placement of EPL stencil masks
- Author(s):
Yusa, S. ( Dai Nippon Printing Co., Ltd. (Japan) ) Ishikawa, M. ( Dai Nippon Printing Co., Ltd. (Japan) ) Kinase, Y. ( Dai Nippon Printing Co., Ltd. (Japan) ) Takikawa, T. ( Dai Nippon Printing Co., Ltd. (Japan) ) Fujita, H. ( Dai Nippon Printing Co., Ltd. (Japan) ) Sano, H. ( Dai Nippon Printing Co., Ltd. (Japan) ) Houga, M. ( Dai Nippon Printing Co., Ltd. (Japan) ) Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 923
- Page(to):
- 931
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Primary evaluation of proximity and resist heating effects observed in high-acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Experimental analysis of image placement accuracy of single-membrane masks for LEEPL [5853-81]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
EPL stencil mask defect inspection system using transmission electron beam
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |