A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging
- Author(s):
Iwase, K. ( Sony Corp. (Japan) ) Omori, S. ( Sony Corp. (Japan) ) Nohama, S. ( Sony Corp. (Japan) ) Yotsui, K. ( Toppan Printing Co., Ltd. (Japan) ) Suzuki, G. ( Toppan Printing Co., Ltd. (Japan) ) Sasaki, Y. ( Toppan Printing Co., Ltd. (Japan) ) Itoh, K. ( Toppan Printing Co., Ltd. (Japan) ) Tamura, A. ( Toppan Printing Co., Ltd. (Japan) ) Maruyama, S. ( Tokyo Seimitsu Co., Ltd. (Japan) ) Moriya, S. ( Sony Corp. (Japan) ) Kitagawa, T. ( Sony Corp. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 915
- Page(to):
- 922
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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