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A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Author(s):
Iwase, K. ( Sony Corp. (Japan) )
Omori, S. ( Sony Corp. (Japan) )
Nohama, S. ( Sony Corp. (Japan) )
Yotsui, K. ( Toppan Printing Co., Ltd. (Japan) )
Suzuki, G. ( Toppan Printing Co., Ltd. (Japan) )
Sasaki, Y. ( Toppan Printing Co., Ltd. (Japan) )
Itoh, K. ( Toppan Printing Co., Ltd. (Japan) )
Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )
Maruyama, S. ( Tokyo Seimitsu Co., Ltd. (Japan) )
Moriya, S. ( Sony Corp. (Japan) )
Kitagawa, T. ( Sony Corp. (Japan) )
6 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
915
Page(to):
922
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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