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Study of mask process development for EUVL

Author(s):
Abe, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Nishiguchi, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Amano, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Motonaga, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Tanaka, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )
Yamanashi, H. ( Association of Super-Advanced Electronics Technologies (Japan) )
Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
832
Page(to):
840
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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