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Study of an image stitching method for linewidth measurement

Author(s):
  • Chu, W. ( Harbin Institute of Technology (China) )
  • Zhao, X. ( Harbin Institute of Technology (China) )
  • Fu, J. ( National Institute of Standards and Technology (USA) )
  • Vorburger, T.V. ( National Institute of Standards and Technology (USA) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
776
Page(to):
783
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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