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Mask CD measurements with an atomic force microscope

Author(s):
  • Yoshida, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Abe, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
759
Page(to):
769
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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