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The study of high-speed electron beam deflection technology for VSB writers

Author(s):
Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hoshi, H. ( JEOL Ltd. (Japan) )
Ando, H. ( Hitachi High-Technologies Co. (Japan) )
Tsuchiya, S. ( NuFlare Technology Inc. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
681
Page(to):
688
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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