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Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Author(s):
Jang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Ahn, B.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
669
Page(to):
674
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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