CPL mask technology for sub-100-nm contact hole imaging

CPL mask technology for sub-100-nm contact hole imaging

Author(s):

Kasprowicz, B.S. ( Photronics, Inc. (USA) )

Conley, W.E. ( Motorola, Inc. (USA) )

Litt, L.C. ( Motorola, Inc. (USA) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Montgomery, P.K. ( Motorola, Inc. (USA) )

Socha, R.J. ( Motorola, Inc. (USA) )

Wu, W. ( Motorola, Inc. (USA) )

Lucas, K.D. ( Motorola, Inc. (USA) )

Roman, B.J. ( Motorola, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Wampler, K.E. ( ASML MaskTools, Inc. (USA) )

Laidig, T.L. ( ASML MaskTools, Inc. (USA) )

Progler, C.J. ( Photronics, Inc. (USA) )

Hathorn, M.E. ( Rochester Institute of Technology (USA) )

9 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

624

Page(to):

631

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013799
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

Similar Items:

1 Conference Proceedings CPL reticle technology for advanced device applications Conley, W.E., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings The impact of MEEF through pitch for 120-nm contact holes Litt, L.C., Wu, W., Conley, W., Lucas, K.D., Roman, B.J., Montgomery, P., Kasprowicz, B.S., Progler, C.J., Socha, R.J., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings The application of CPL reticle technology for the 0.045-mm node Conley, W., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of chromeless phase lithography (CPL) masks in ArF lithography Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Defect printability in CPL mask technology Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings RET integration of CPL technology for random logic Hsu, S.D., Van Den Broeke, D.J., Chen, J.F., Shi, X., Hsu, M., Laidig, T.L., Conley, W., Litt, L.C., Wu, W. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12