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CPL mask technology for sub-100-nm contact hole imaging

Author(s):
Kasprowicz, B.S. ( Photronics, Inc. (USA) )
Conley, W.E. ( Motorola, Inc. (USA) )
Litt, L.C. ( Motorola, Inc. (USA) )
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )
Montgomery, P.K. ( Motorola, Inc. (USA) )
Socha, R.J. ( Motorola, Inc. (USA) )
Wu, W. ( Motorola, Inc. (USA) )
Lucas, K.D. ( Motorola, Inc. (USA) )
Roman, B.J. ( Motorola, Inc. (USA) )
Chen, J.F. ( ASML MaskTools, Inc. (USA) )
Wampler, K.E. ( ASML MaskTools, Inc. (USA) )
Laidig, T.L. ( ASML MaskTools, Inc. (USA) )
Progler, C.J. ( Photronics, Inc. (USA) )
Hathorn, M.E. ( Rochester Institute of Technology (USA) )
9 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. date:
2004
Page(from):
624
Page(to):
631
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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