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Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Author(s):
  • Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
603
Page(to):
614
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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