Through-pitch low-k1 contact hole imaging with CPL technology
- Author(s):
Wiaux, V. ( IMEC (Belgium) ) Bekaert, J. ( IMEC (Belgium) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Ronse, K.G. ( IMEC (Belgium) ) Socha, R.J. ( ASML Technology Development Ctr. (USA) ) Vandenberghe, G. ( IMEC (Belgium) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 585
- Page(to):
- 594
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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