CPL reticle technology for advanced device applications

CPL reticle technology for advanced device applications

Author(s):

Conley, W.E. ( Motorola, Inc. (USA) )

Van Den Broeke, D.J. ( ASML (USA) )

Socha, R.J. ( ASML (USA) )

Wu, W. ( Motorola, Inc. (USA) )

Litt, L.C. ( Motorola, Inc. (USA) )

Lucas, K.D. ( Motorola, Inc. (USA) )

Roman, B.J. ( Motorola, Inc. (USA) )

Peters, R.D. ( Motorola, Inc. (USA) )

Parker, C. ( Motorola, Inc. (USA) )

Chen, J.F. ( ASML (USA) )

Wampler, K.E. ( ASML (USA) )

Laidig, T.L. ( ASML (USA) )

Schaefer, E. ( ASML (Netherlands) )

Kuijten, J.-P. ( ASML (Netherlands) )

Verhappen, A. ( ASML (Netherlands) )

van de Goor, S. ( ASML (Netherlands) )

Chaplin, M. ( ASML (USA) )

Kasprowicz, B.S. ( Photronics, Inc. (USA) )

Progler, C.J. ( Photronics, Inc. (USA) )

Robert, E. ( STMicroelectronics (France) )

Thony, P. ( STMicroelectronics (France) )

Hathorn, M.E. ( Rochester Institute of Technology (USA) )

17 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

578

Page(to):

584

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013799
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

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