
CPL reticle technology for advanced device applications
- Author(s):
Conley, W.E. ( Motorola, Inc. (USA) ) Van Den Broeke, D.J. ( ASML (USA) ) Socha, R.J. ( ASML (USA) ) Wu, W. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Lucas, K.D. ( Motorola, Inc. (USA) ) Roman, B.J. ( Motorola, Inc. (USA) ) Peters, R.D. ( Motorola, Inc. (USA) ) Parker, C. ( Motorola, Inc. (USA) ) Chen, J.F. ( ASML (USA) ) Wampler, K.E. ( ASML (USA) ) Laidig, T.L. ( ASML (USA) ) Schaefer, E. ( ASML (Netherlands) ) Kuijten, J.-P. ( ASML (Netherlands) ) Verhappen, A. ( ASML (Netherlands) ) van de Goor, S. ( ASML (Netherlands) ) Chaplin, M. ( ASML (USA) ) Kasprowicz, B.S. ( Photronics, Inc. (USA) ) Progler, C.J. ( Photronics, Inc. (USA) ) Robert, E. ( STMicroelectronics (France) ) Thony, P. ( STMicroelectronics (France) ) Hathorn, M.E. ( Rochester Institute of Technology (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 578
- Page(to):
- 584
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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