Contact hole reticle optimization by using interference mapping lithography (IML)
- Author(s):
Socha, R.J. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. ( ASML MaskTools, Inc. (USA) ) Corcoran, N.P. ( ASML MaskTools, Inc. (USA) ) Hollerbach, U. ( ASML MaskTools, Inc. (USA) ) Wampler, K.E. ( ASML MaskTools, Inc. (USA) ) Shi, X. ( ASML MaskTools, Inc. (USA) ) Conley, W.E. ( Motorola, Inc. (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 516
- Page(to):
- 534
- Pages:
- 19
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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