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Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Author(s):
Chou, S.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
You, J.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shiu, L.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chang, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
508
Page(to):
515
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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