Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks
- Author(s):
- Robinson, T.E. ( FEI Co. (USA) )
- Graupera, A. ( FEI Co. (USA) )
- Morrison, T.B. ( FEI Co. (USA) )
- Ramstein, M. ( Advanced Mask Technology Center (Germany) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 384
- Page(to):
- 401
- Pages:
- 18
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
New advancements in focused ion beam repair of alternating phase-shift masks
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Focused ion beam repair for quartz bump defect of alternating phase-shift masks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Quantitative evaluation of focused ion-beam repair for quartz bump defect of alternating phase-shift masks
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |