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Photomask quality assessment solution for 90-nm technology node

Author(s):
Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Chung, D.H.P. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Nobuyuki, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Tateno, M. ( NEC Corp. (Japan) )
Matsumura, K. ( NEC Corp. (Japan) )
Chen, J.-H. ( Synopsys, Inc. (USA) )
Luk-Pat, G.T. ( Synopsys, Inc. (USA) )
Fukui, N. ( Synopsys, Inc. (USA) )
Tanaka, Y. ( Synopsys, Inc. (USA) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
364
Page(to):
374
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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