FIB mask repair technology for electron projection lithography

FIB mask repair technology for electron projection lithography

Author(s):

Yamamoto, Y. ( SII Nanotechnology Inc. (Japan) )

Hasuda, M. ( SII Nanotechnology Inc. (Japan) )

Suzuki, H. ( SII Nanotechnology Inc. (Japan) )

Sato, M. ( SII Nanotechnology Inc. (Japan) )

Takaoka, O. ( SII Nanotechnology Inc. (Japan) )

Matsumura, H. ( SII Nanotechnology Inc. (Japan) )

Matsumoto, N. ( SII Nanotechnology Inc. (Japan) )

Iwasaki, K. ( SII Nanotechnology Inc. (Japan) )

Hagiwara, R. ( SII Nanotechnology Inc. (Japan) )

Suzuki, K. ( SII Nanotechnology Inc. (Japan) )

Ikku, Y. ( SII Nanotechnology Inc. (Japan) )

Aita, K. ( SII Nanotechnology Inc. (Japan) )

Kaito, T. ( SII Nanotechnology Inc. (Japan) )

Adachi, T. ( SII Nanotechnology Inc. (Japan) )

Yasaka, A. ( SII Nanotechnology Inc. (Japan) )

Yamamoto, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Iwasaki, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

13 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

348

Page(to):

356

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013798
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

Similar Items:

1 Conference Proceedings Advanced FIB mask repair technology for 100-nm/ArF lithography Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Advanced photomask repair technology for 65-nm lithography: II Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Advanced FIB mask repair technology for 100-nm/ArF lithography: II Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Advanced photomask repair technology for 65 nm lithography (4) [5992-170] Itou, Y., Tanaka, Y., Suga, O., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Advanced FIB mask repair technology for ArF lithography: ？ Hagiwara,R., Yasaka,A., Takaoka,O., Kozakai,T., Yabe,S., Koyama,Y., Muramatsu,M., Doi,T., Suzuki,K., Okabe,M., Aita,K., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Advanced photomask repair technology for 65-nm lithography (1) Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Tashiro, J., Suzuki, K., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Advanced FIB mask repair technology for 90-nm/ArF lithography: III Tanaka, Y., Itou, Y., Yoshioka, N., Hagiwara, R., Yasaka, A., Takaoka, O., Kozakai, T., Koyama, Y., Sawaragi, H., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Advanced photomask repair technology for 65nm lithography (3) [5853-89] Itou, Y., Tanaka, Y., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., Suzuki, K., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Advanced FIB mask repair technology in ArF lithography Hiruta,K., Kubo,S., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Advanced photomask repair technology for 65-nm lithography [6349-50] Aramaki, F., Kozakai, T., Muramatsu, M., Sugiyama, Y., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Doi, T., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Advanced FIB mask repair technology for ArF lithography: ？ Kubo,S., Hiruta,K., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Advanced photomask repair technology for 65nm lithography (5) [6283-108] Aramaki, F., Kozakai, T., Sugiyama, Y., Muramatsu, M., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Hagiwara, R., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12