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The judgment criteria of halftone pinhole defects

Author(s):
Shin, K.M. ( Photronics PKL Co., Ltd. (South Korea) )
Kim, D.-W. ( Photronics PKL Co., Ltd. (South Korea) )
Lee, J.-K. ( Photronics PKL Co., Ltd. (South Korea) )
Lee, D.-H. ( Photronics PKL Co., Ltd. (South Korea) )
Kim, J.-M. ( Photronics PKL Co., Ltd. (South Korea) )
Choi, S.-S. ( Photronics PKL Co., Ltd. (South Korea) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
330
Page(to):
341
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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