Advanced photomask repair technology for 65-nm lithography (1)

Advanced photomask repair technology for 65-nm lithography (1)

Author(s):

Itou, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Sugiyama, Y. ( SII NanoTechnology Inc. (Japan) )

Hagiwara, R. ( SII NanoTechnology Inc. (Japan) )

Takahashi, H. ( SII NanoTechnology Inc. (Japan) )

Takaoka, O. ( SII NanoTechnology Inc. (Japan) )

Tashiro, J. ( SII NanoTechnology Inc. (Japan) )

Suzuki, K. ( SII NanoTechnology Inc. (Japan) )

Okabe, M. ( SII NanoTechnology Inc. (Japan) )

Kikuchi, S. ( SII NanoTechnology Inc. (Japan) )

Uemoto, A. ( SII NanoTechnology Inc. (Japan) )

Yasaka, A. ( SII NanoTechnology Inc. (Japan) )

Adachi, T. ( SII NanoTechnology Inc. (Japan) )

Nishida, N. ( HOYA Corp. (Japan) )

Ozawa, T. ( HOYA Corp. (Japan) )

11 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

301

Page(to):

312

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013798
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

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