Demonstration of damage-free mask repair using electron beam-induced processes
- Author(s):
Liang, T. ( Intel Corp. (USA) ) Stivers, A.R. ( Intel Corp. (USA) ) Penn, M. ( Intel Corp. (USA) ) Bald, D. ( Intel Corp. (USA) ) Sethi, C. ( Intel Corp. (USA) ) Boegli, V. ( NaWoTec GmbH (Germany) ) Budach, M. ( NaWoTec GmbH (Germany) ) Edinger, K. ( NaWoTec GmbH (Germany) ) Spies, P. ( NaWoTec GmbH (Germany) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 291
- Page(to):
- 300
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.1
- Type:
- Conference Proceedings
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