Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback
- Author(s):
Berger, L. ( STEAG HamaTech AG (Germany) ) Saule, W. ( STEAG HamaTech AG (Germany) ) Dress, P. ( STEAG HamaTech AG (Germany) ) Gairing, T.M. ( STEAG HamaTech AG (Germany) ) Chen, C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 148
- Page(to):
- 154
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.1
- Type:
- Conference Proceedings
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