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Analysis of mask CD error by dose modulation for fogging effect

Author(s):
Lee, H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, B.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
143
Page(to):
147
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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