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Improvement of develop loading effect in the FEP-171 process

Author(s):
  • Ha, T.-J. ( Hynix Semiconductor Inc. (South Korea) )
  • Lee, Y.-M. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, B.K. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, Y. ( Hynix Semiconductor Inc. (South Korea) )
  • Han, O. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
118
Page(to):
127
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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