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Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)

Author(s):
Courboin, D. ( DuPont Photomasks Korea Ltd. (South Korea) )
Choi, J.W. ( DuPont Photomasks Korea Ltd. (South Korea) )
Jung, S.H. ( DuPont Photomasks Korea Ltd. (South Korea) )
Baek, S.H. ( DuPont Photomasks Korea Ltd. (South Korea) )
Kim, L.-J. ( DuPont Photomasks Korea Ltd. (South Korea) )
Ahn, C.N. ( DuPont Photomasks Korea Ltd. (South Korea) )
Kim, H.-S. ( DuPont Photomasks Korea Ltd. (South Korea) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. date:
2004
Page(from):
106
Page(to):
117
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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