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Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors

Author(s):
Chen, C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yeh, L.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lien, T.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chuo, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
28
Page(to):
37
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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