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New approach for quartz dry etching using hardmask for sub-90-nm photomask technology

Author(s):
Huh, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, K.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Jang, I.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Hwang, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. date:
2004
Page(from):
19
Page(to):
27
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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