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Patterning sub-50-nm Fin-FET using KrF lithography tool

Author(s):
Singh, N. ( Institute of Microelectronics (Singapore) )
Jagar, S. ( Institute of Microelectronics (Singapore) )
Mehta, S.S. ( Institute of Microelectronics (Singapore) )
Roy, M.M. ( Institute of Microelectronics (Singapore) )
Kumar, R. ( Institute of Microelectronics (Singapore) )
Balasubramanian, N. ( Institute of Microelectronics (Singapore) )
1 more
Publication title:
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5379
Pub. date:
2004
Page(from):
260
Page(to):
267
Pages:
8
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452924 [0819452920]
Language:
English
Call no.:
P63600/5379
Type:
Conference Proceedings

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