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Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

Author(s):
Roy, S. ( ASML MaskTools, Inc. (USA) )
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )
Chen, J.F. ( ASML MaskTools, Inc. (USA) )
Liebchen, A. ( ASML MaskTools, Inc. (USA) )
Chen, T. ( ASML MaskTools, Inc. (USA) )
Hsu, S.D. ( ASML MaskTools, Inc. (USA) )
Shi, X. ( ASML MaskTools, Inc. (USA) )
Socha, R.J. ( ASML TDC (USA) )
3 more
Publication title:
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5379
Pub. date:
2004
Page(from):
190
Page(to):
201
Pages:
12
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452924 [0819452920]
Language:
English
Call no.:
P63600/5379
Type:
Conference Proceedings

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