Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

Author(s):

Roy, S. ( ASML MaskTools, Inc. (USA) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Liebchen, A. ( ASML MaskTools, Inc. (USA) )

Chen, T. ( ASML MaskTools, Inc. (USA) )

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) )

Socha, R.J. ( ASML TDC (USA) )

3 more

Publication title:

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5379

Pub. Year:

2004

Page(from):

190

Page(to):

201

Pages:

12

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452924 [0819452920]

Language:

English

Call no.:

P63600/5379

Type:

Conference Proceedings

Details

TDL ID:	ZA00013731
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Design and process integration for microelectronic manufacturing
Conf. info. (Number):	2004 : 2nd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.26-2004.02.27

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