Improving manufacturing variability control in advanced CMOS technology by using TCAD methodology

Improving manufacturing variability control in advanced CMOS technology by using TCAD methodology

Author(s):

Chen, J. ( Texas Instruments Inc. (USA) )
Wu, J. ( Texas Instruments Inc. (USA) )
Liu, K. ( Texas Instruments Inc. (USA) )
Yang, H. ( Texas Instruments Inc. (USA) )
Scott, D. ( Texas Instruments Inc. (USA) )

Publication title:

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5378

Pub. Year:

2004

Page(from):

215

Page(to):

220

Pages:

6

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452917 [0819452912]

Language:

English

Call no.:

P63600/5378

Type:

Conference Proceedings

Details

TDL ID:	ZA00013730
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2004
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.26-2004.02.27

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