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Improvement of 90nm KrF Cu process window by minimizing via deformation caused by low-frequency resonance of scanner projection lens

Author(s):
  • Fang, S.-P. ( United Microelectronics Corp. (Taiwan) )
  • Lin, B.S. ( United Microelectronics Corp. (Taiwan) )
  • Hung, K.-C. ( United Microelectronics Corp. (Taiwan) )
Publication title:
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5378
Pub. Year:
2004
Page(from):
172
Page(to):
183
Pages:
12
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452917 [0819452912]
Language:
English
Call no.:
P63600/5378
Type:
Conference Proceedings

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