In-line lithography cluster monitoring and control using integrated scatterometry
- Author(s):
Pollentier, I. ( IMEC (Belgium) ) Cheng, S.Y. ( IMEC (Belgium) ) Baudemprez, B. ( IMEC (Belgium) ) Laidler, D. ( IMEC (Belgium) ) van Dommelen, Y. ( ASML (Netherlands) ) Carpaij, R. ( ASML (Netherlands) ) Yu, J. ( Tokyo Electron Ltd. (Japan) ) Uchida, J. ( Tokyo Electron Ltd. (Japan) ) Viswanathan, A. ( Tokyo Electron Ltd. (Japan) ) Chin, D. ( Tokyo Electron Ltd. (Japan) ) Barry, K. ( Tokyo Electron Ltd. (Japan) ) Jakatdar, N. ( Tokyo Electron Ltd. (Japan) ) - Publication title:
- Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5378
- Pub. Year:
- 2004
- Page(from):
- 105
- Page(to):
- 115
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452917 [0819452912]
- Language:
- English
- Call no.:
- P63600/5378
- Type:
- Conference Proceedings
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