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In-line lithography cluster monitoring and control using integrated scatterometry

Author(s):
Pollentier, I. ( IMEC (Belgium) )
Cheng, S.Y. ( IMEC (Belgium) )
Baudemprez, B. ( IMEC (Belgium) )
Laidler, D. ( IMEC (Belgium) )
van Dommelen, Y. ( ASML (Netherlands) )
Carpaij, R. ( ASML (Netherlands) )
Yu, J. ( Tokyo Electron Ltd. (Japan) )
Uchida, J. ( Tokyo Electron Ltd. (Japan) )
Viswanathan, A. ( Tokyo Electron Ltd. (Japan) )
Chin, D. ( Tokyo Electron Ltd. (Japan) )
Barry, K. ( Tokyo Electron Ltd. (Japan) )
Jakatdar, N. ( Tokyo Electron Ltd. (Japan) )
7 more
Publication title:
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5378
Pub. Year:
2004
Page(from):
105
Page(to):
115
Pages:
11
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452917 [0819452912]
Language:
English
Call no.:
P63600/5378
Type:
Conference Proceedings

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