Advanced module-based approach to effective CD prediction of sub-100nm patterns

Advanced module-based approach to effective CD prediction of sub-100nm patterns

Author(s):

Shin, J. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, I. ( Samsung Electronics Co., Ltd. (South Korea) )

Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) )

Park, D.-W. ( Samsung Electronics Co., Ltd. (South Korea) )

Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )

Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )

Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )

3 more

Publication title:

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5378

Pub. Year:

2004

Page(from):

65

Page(to):

73

Pages:

9

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452917 [0819452912]

Language:

English

Call no.:

P63600/5378

Type:

Conference Proceedings

Details

TDL ID:	ZA00013730
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2004
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.26-2004.02.27

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