Simulation benchmarking for the whole resist process

Simulation benchmarking for the whole resist process

Author(s):

Kim, S.-K. ( Hanyang Univ. (South Korea) )
Lee, J.-E. ( Hanyang Univ. (South Korea) )
Park, S.-W. ( Hanyang Univ. (South Korea) )
Yoo, J.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Oh, H.- ( Hanyang Univ. (South Korea) )

Publication title:

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5378

Pub. Year:

2004

Page(from):

58

Page(to):

64

Pages:

7

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452917 [0819452912]

Language:

English

Call no.:

P63600/5378

Type:

Conference Proceedings

Details

TDL ID:	ZA00013730
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data analysis and modeling for process control
Conf. info. (Number):	2004
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.26-2004.02.27

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