TTR (through the reticle) alignment system with photoresist ablation technique
- Author(s):
Tanaka, R. ( Nikon Corp. (Japan) ) Kobayashi, M. ( Nikon Corp. (Japan) ) Yasuda, M. ( Nikon Corp. (Japan) ) Magome, N. ( Nikon Corp. (Japan) ) Ishigo, K. ( Toshiba Corp. (Japan) ) Ikegami, H. ( Toshiba Corp. (Japan) ) Higashiki, T. ( Toshiba Corp. (Japan) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1828
- Page(to):
- 1835
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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