Improvements in CaF2 material properties for next-generation microlithography applications

Improvements in CaF2 material properties for next-generation microlithography applications

Author(s):

Kohli, J.T. ( Corning Inc. (USA) )
Li, Q. ( Corning Inc. (USA) )
Rosch, W.R. ( Corning Inc. (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1735

Page(to):

1739

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Advanced IRFPAs for next-generation sensors Caulfield, J.T., Fletcher, C.L., Graham, R.W., Patten, E.A., Pham, L.T., Pierce, G., Scribner, D.A., Skele, M., Taylor, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings *MICROGRAVITY MATERIALS PROCESSING FOR COMMERCIAL APPLICATIONS Kohli, R., Brusky, P. L., Diamond, S., Markworth, A. J., McGinnis, V. D., Melling, P. J., Spinosa, E. D., Collins, E. W. Materials Research Society
2 Conference Proceedings Study of CaF₂ samples using DUV birefringence measurement and x-ray diffraction techniques B. Wang, W. Rosch Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings IMPROVING THE STRUCTURAL AND ELECTRICAL PROPERTIES OF EPITAXIAL CaF2 ON Si BY RAPID THERMAL ANNEALING Phillips, J.M., Manger, M.L., Pfeiffer, L., Joy, D.C., Smith III, T.P., Augustyniak, W.M., West, K.W. Materials Research Society
3 Conference Proceedings ELECTRICAL PROPERTIES AND STRUCTURE DEFECTS IN EPITAXIAL CaF2 ON Si Schowalter, L.J., Fathauer, R.W., Ponce, F.A., Anderson, G., Hashimoto, Shin Materials Research Society	9 Conference Proceedings Superplastic Extrusion of Nano-Structured Si2N2O-Sialon J.T. Luo, Q. Zhang, H.B. Li Trans Tech Publications
4 Conference Proceedings Resist materials for 157-nm microlithography: an update Willson,C.G., Tran,H.V., Trinque,B.C., Chiba,T., Yamada,S., Sanders,D.P., Connor,E.F., Grubbs,R.H., Klopp,J.M., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Combustion Synthesis: A Rapid Way for Preparing Bulk Cu2SnSe3 Thermoelectric Materials G.H. Liu, R. Ma, J.T. Li, Y.Y. Li Trans Tech Publications
5 Conference Proceedings TEMPERATURE DEPENDENCE OF THE ELECTRICAL PROPERTIES OF EPITAXIAL CaF2 LAYERS ON Si (111) Fathauer, R. W., Schowalter, L.. J. Materials Research Society	11 Conference Proceedings ELECTRICAL CHARACTERIZATION OF THE CaF2/Si-EPITAXIAL INSULATOR/SEMICONDUCTOR INTERFACE BY MIS ADMITTANCE People, R., Smith III, T. P., Phillips, J. M., Augustyniak, W. M., Wecht, K. W. Materials Research Society
6 Conference Proceedings Overview of innovative next generation materials for security and defense applications E. W. Taylor, L. R. Taylor Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings HETEROEPITAXY OF Si AND Ge ON CaF2/Si(lll) Fathauer, R.W., Schowalter, L.J., Lewis, N., Hall, E.L. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12