Full-field imaging with a 157-nm scanner
- Author(s):
Robinson, C. ( IBM Microelectronics Div. (USA) ) Seong, N. ( IBM Microelectronics Div. (USA) ) Kimmel, K. ( IBM Microelectronics Div. (USA) ) Brunner, T.A. ( IBM Microelectronics Div. (USA) ) Hibbs, M. ( IBM Microelectronics Div. (USA) ) Lercel, M.J. ( IBM Microelectronics Div. (USA) ) McCafferty, D. ( ASML (USA) ) Sewell, H. ( ASML (USA) ) O'Neil, T.K. ( ASML (USA) ) Ivaldi, J. ( ASML (USA) ) Andresen, K. ( ASML (USA) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1669
- Page(to):
- 1678
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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