157-nm photoresist process optimization for a full-field scanner
- Author(s):
Light, S. ( IMEC (Belgium) and IMEC (Belgium) ) Stepanenko, N. ( IMEC (Belgium) and IMEC vzw (Belgium) ) Gronheid, R. ( IMEC (Belgium) ) Van Roey, F. ( IMEC (Belgium) ) Van den Heuvel, D. ( IMEC (Belgium) ) Goethals, A.-M. ( IMEC (Belgium) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1658
- Page(to):
- 1668
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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