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Simple 157-nm interference illumination system for pattern formation

Author(s):
Park, S.-W. ( Hanyang Univ. (South Korea) )
Jeong, J. ( Hanyang Univ. (South Korea) )
Choi, J. ( Hanyang Univ. (South Korea) )
Oh, H. ( Hanyang Univ. (South Korea) )
Kim, J. ( Seoul National Univ. (South Korea) )
Park, I. ( Univ. of Inchon (South Korea) )
1 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1641
Page(to):
1647
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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