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157-nm chromeless phase lithography for 45-nm SRAM gate

Author(s):
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Matsuura, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( NEC Electronics Corp. (Japan) )
Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
2 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1616
Page(to):
1626
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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