Evaluation systems of F2 laser lithography materials

Evaluation systems of F2 laser lithography materials

Author(s):

Itakura, Y. ( Komatsu Ltd. (Japan) )

Kawasa, Y. ( Komatsu Ltd. (Japan) )

Egawa, K. ( Komatsu Ltd. (Japan) )

Sumitani, A. ( Komatsu Ltd. (Japan) )

Sasaki, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Higasikawa, I. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( NEC Electronics Corp. (Japan) )

Nakano, H. ( Canon Inc. (Japan) )

Hata, H. ( Canon Inc. (Japan) )

6 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1606

Page(to):

1615

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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