157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons

157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons

Author(s):

Lee, K. ( Columbia Univ. (USA) )

Jockusch, S. ( Columbia Univ. (USA) )

Turro, N.J. ( Columbia Univ. (USA) )

French, R.H. ( DuPont (USA) )

Wheland, R.C. ( DuPont (USA) )

Lemon, M.F. ( DuPont (USA) )

Braun, A.M. ( Univ. Karlsruhe (Germany) )

Widerschpan, T. ( Univ. Karlsruhe (Germany) )

Zimmerman, P. ( International SEMATECH (USA) )

4 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1598

Page(to):

1605

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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