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Effect of the effective resist diffusion length to the photolithography at 65- and 45-nm nodes: a study with simple and accurate analytical equations

Author(s):
  • Wu, Q. ( IBM Microelectronics Div. (USA) )
  • Halle, S.D. ( IBM Microelectronics Div. (USA) )
  • Zhao, Z. ( IBM Microelectronics Div. (USA) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1510
Page(to):
1521
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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