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A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Author(s):
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, D.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, H.-C. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1413
Page(to):
1421
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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