A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
- Author(s):
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, D.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, H.-C. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1413
- Page(to):
- 1421
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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